In the following the traveler sheet of our fabrications process can be found
| Project | SPL-BE Cavity QED – 1st Run | |||
| Substrate material/size | Si/2″ | |||
| Step | Equipment | Details | Notes | |
| 1 | EBL | |||
| Cleaning | – | – | – | |
| Spin Coat | Headway Spinner | 500/500rpm/7sec 2500/5000rpm/80s | Used non-diluted ZEP-520A from Duke | |
| Soft bake | Hot plate | 180degreeC/2min | ||
| Thickness Inspection | Filmetric/Nanometric | 3734A | We need to calibrate filmetric at NNF | |
| Exposeure | Elionix ELS-7500 EX | |||
| Inspect | – | – | – | |
| 2 | Development | |||
| Devlop | Development hood | Developer: n-Amyl Acetate (60-120s)/Developer: O-Xylene (>95% Purity) (240-300s) Rinse: IPA (30s) Dry: N2 gas | I used n-Amyl Acetate as we didn’t have O-Xylene here at NNF | |
| Thickness Inspection | Filmetric/Nanometric(RI of ZEP=1.64) | less than 100A | We need to calibrate filmetric at NNF Looks like all the resis has gone | |
| Inspection | Optical Microscope | Just to see if something’s there | ||
| 3 | RIE | |||
| DRIE | Plasmalab Cobra | 150mm_Si_Etch | 10min | |
| 4 | Cleaning | |||
| Stripping off resist | 1165 Stripper (NMP) at 60C | |||
| 5 | FIB/SEM | |||
| SEM Imaging | FIB/SEM | |||
The optical microscope images of the etched structure:
