Puled Laser Depostion of Thin Films, Summer 2012

Posted May 1, 2012
Course: ECEN 5060
Class meeting: TTH 8:30-9:50 am
Office hours: TTH: 9:50-10:50 am
 
 
Instructor: Dr. Daryoosh Vashaee
Contact: (918) 459-8017; daryoosh.vashaee@okstate.edu
 
Text:
           “Pulsed Laser Deposition of Thin Films” Douglas B. Chrisey and Graham K. Hubler
 
Grading Procedure:
 
            Homework: 30% Project: 40% Final exam: 30%
 
            Please review the OSU Administrative Regulations and Student Policies as found in the OSU Catalog.
            Anyone who has any disability or need which requires special attention should make this known
            to both myself and the ECEN Department.
 
Course syllabus:
 
This course goes over the theoretical and practical aspects of thin film growth techniques with emphasis on pulsed laser deposition. After discussing about the excimer laser and deposition system, the process of pulsed laser sputtering is discussed. The course covers the primary mechanisms such as collision, thermal, electronic, exfoliational, and hydrodynamic sputtering, and the secondary mechanisms including outflow and effusion with reflection and recondensation. The course continue with covering the topics on surface modification of materials by laser irradiation, diagnostics and characteristics of laser produced plasmas, particulates generated by pulsed laser ablation, and angular distribution of ablated materials. Advanced topics on novel PLD approaches, process characteristics and film properties, and the future trends are also discussed.
 
We will follow the textbook and the class hand outs in this course. The course covers chapters 2, 3, 4, 6, 7, and 10 of the text.
 
Course materials:
 
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               Part 2
 
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